Used Pvd for sale (8)

Condition: used, Huttinger TIG 30 DC Plasma Generator and Surface Treatment Power Source Huttinger TIG 30 DC Plasma Generator and Surface Treatment Power Source with J. Schneider Transformer, Used machine Gbjdpfxs Akcfcs Aanow Manufacturer: Huttinger / J. Schneider Elektrotechnik Type: TIG 30 DC industrial plasma generator, vacuum technology and surface treatment power source Power / Capacity: 33 kVA (J. Schneider DLAS transformer) Electrical data: Primary: 400/480 V (49/41 A), Secondary: 3x 255 V (25 A), 50/60 Hz Weight: 520 kg Condition: Used, good condition Overall dimensions (Length x Width x Height): 640 x 870 x 2250 mm

Year of construction: 2023, condition: ready for operation (used), A complete PVD hard coating system including peripheral equipment is available. 1) PVD hard coating system Platit Pi111 Plus G3, year of manufacture: 2023, deposition process: ARC, cathodes: 2, targets: 2, max. coating diameter: 353mm, max. coating height: 498mm, max. load: 160kg, max. workpiece diameter: 355mm, machine dimensions X/Y/Z: approx. 1950mm/1600mm/2250mm, control system: Platit. 2) Screw compressor Almig F-Drive 22, year of manufacture: 2022, flow rate: 4.14m³/min, final pressure range: 5bar-13bar, motor power: 22kW. 3) Compressed air receiver OKS, year of manufacture: 2023, volume: 1000l, operating pressure min./max.: 0bar/11bar, test pressure: 16bar. 4) Blast cabinet MHG SMG50, year of manufacture: 2024. 5) Osmosis Pro water filtration unit. Documentation available. An on-site inspection is possible. Godpfxjzhb Hlj Aanebw

Year of construction: 2023, condition: excellent (used), functionality: fully functional, Number of heating elements: 4 Power (per heater): approx. 10 kW (230 V/400 V) Max. temperature: 700 °C Max. process temperature: 600 °C Thermocouple: Type K Godpfxjy Htgwe Aanjbw Temperature control: PLC software-based regulation Thyristor controller: AEG Thyro 1A-230-60H Cooling (chamber): Consumption 2: (4.0...8.5) m³/h Inlet temperature: (15...18) °C Outlet temperature: (20...28) °C Pressure: (3.5...4.5) bar Water quality: mechanically clean, visually clear pH value (at 20 °C): (6.5...8) Max. particle size: < 25 μm Water hardness: < 15 °dH Chloride ions: < 80 mg/l Total chloride and sulfate content: < 160 mg/l Cooling (evaporator): Consumption 3: (1.5...2.5) m³/h Inlet temperature: (6...10) °C Outlet temperature: (12...15) °C Pressure: (3.5...4.5) bar Water quality: mechanically clean, visually clear pH value (at 20 °C): (6.5...8) Max. particle size: < 25 μm Water hardness: < 15 °dH Chloride ions: < 80 mg/l Total chloride and sulfate content: < 160 mg/l

Condition: used, Year of construction: 1999, functionality: unexamined, Good day, For sale is a sputtering system for glass manufactured by Beijing Instruments Factory / JDS, model JDS800. The system utilizes the Physical Vapor Deposition (PVD) process to horizontally deposit coatings onto substrates. The unit measures approximately 5 meters in length and 1 meter in width. The substrate size is about 400 x 420 mm. Please refer to the photos for detailed dimensions. The system is complete with various power supplies, fore-vacuum pumps, and a turbomolecular pump. Technical drawings are available, along with several folders containing technical documentation. The machine was disconnected from the mains in working condition. Dismantling and transport are the responsibility of the buyer. Gbsdpfey D Uphjx Aansw

Condition: used, The item comes with a selection of spare parts, including: bellows segments, graphite sheets, capacitor transmitters, centering rings in various sizes, Pirani transmitters, inline valves, various cables, and more. Gbsdpezgv R Njfx Aansw

Year of construction: 2006, condition: used, functionality: fully functional, machine/vehicle number: 11176, We are offering this used CemeCon CC 800/9 HIPIMS Magnetron Sputtering PVD System, year of manufacture 2006. Manufacturer: CemeCon Model: CC 800/9 Serial number: 11176 Year of manufacture: 2006, upgraded in 2013 and 2025 Gbjdpsx Tt T Rsfx Aansw Weight: 3,000 kg Protection rating: IP 20 Power rating: 166 kVA Evaporators: 6 Voltage: 3x400/N/PE V Frequency: 50/60 Hz Cemecon CC800/9 HIPIMS - 6 cathodes - All cathodes DC, 2 also HIPIMS capable - Booster anodes - 4 gases, 1 of which is flammable - BIAS: DC, MF-pulsed, or HIPIMS - 3x heating - 2 turbo pumps - 6-position substrate holder - Multiple targets - Includes option for BNC terminal for Peak I, U, and P at HIPIMS cathodes + BIAS - Extensive accessories such as loading material, spare parts, consumables - In 07/2023, the system control was upgraded to the latest standards and a manufacturer service was performed. A bundle option is also available including a chiller, a precision substrate cleaning system, and a lapping/polishing machine. If you have any questions or require further information, please feel free to send us a message or call us.

Condition: used, Edwards Edwards iXH4545H – Industrial High-Vacuum/Dry Pump For sale is an Edwards iXH4545H, MK1 HV MM96 Black EMS version. This unit comes from a technical corporate environment and belongs to the high-performance iXH series from Edwards, which is used worldwide in industrial high-vacuum and coating processes. Device Data Manufacturer: Edwards Model: iXH4545H Version: MK1 HV MM96 Black EMS Weight: approx. 890 kg Gedpozixyfsfx Aansbw Technical Data (iXH series) Dimensions: approx. 1,240 × 860 × 1,310 mm (L × W × H) Pumping speed: up to approx. 4,500 m³/h (depending on gas and configuration) Ultimate pressure: < 1 × 10⁻² mbar Inlet: ISO 100 / ISO 160 Outlet: KF 40 / NW 40 Power supply: 400–480 V, 3-phase Power consumption: typ. 12–18 kW Cooling: water-cooled (approx. 6–10 L/min) Description: The Edwards iXH4545H is an industrial high-vacuum/dry pump from the 4500 series. It is typically used in: PVD / CVD coating Semiconductor industry Process chambers / vacuum furnaces Research & Development Applications with high gas load Chemical/corrosive process gas environment The iXH series is known for its high reliability, robust design, and 24/7 operability. Weight: approx. 890 kg Condition: used Scope of supply: (See picture) (Changes and errors in the technical data are subject to change!) We would be happy to answer any further questions you may have over the phone.

Condition: new, ULVAC Dry Vacuum Pump Here we offer a ULVAC dry vacuum pump. ULVAC Dry Vacuum Pump Solution for demanding process applications Dry vacuum pump ULVAC's unique approach to utilizing the latent heat within the pump body enables the LR/HR/UR series to deliver performance even in the most demanding processes. ULVAC has focused its design efforts on maintaining an extremely uniform high temperature across all pump stages, optimizing this pump family for CVD and etching applications. Compatible with the ULVAC ECO-SHOCK system for additional energy savings. Features Godpszdqtgjfx Aanjbw The LR series pump is designed for load-lock chambers and PVD processes. ULVAC's unique aluminum design enables a very uniform temperature distribution throughout the pump body: The ULVAC LR series pump is designed for applications that require a heated pump, heated gas lines, and/or heated exhaust lines. Excellent helium pumping capacity Encapsulated motor for safety and ease of maintenance Withstands power interruptions of up to 500 ms. Internal components are specially treated to ensure a high degree of surface hardness and excellent corrosion resistance. This prevents wear of internal pump parts when exposed to corrosive gases. (LR Series) Designed for process gases that generate powdery by-products, such as Si crystal growth furnaces Pre-pump for turbo-molecular and mechanical booster pumps Type: LR600 Condition: new Scope of delivery: (See picture) (Changes and errors in technical data and specifications are subject to change!) We will be happy to answer any further questions you may have by telephone.